Cleaning of components
for high-tech applications

This cleaning stage corresponds to the industry standard “oil and grease-free” and forms the basis for all subsequent processes.
The aim is to remove coarse contamination, grease, oil and cooling lubricants from large workpieces.
High-pressure cleaning processes with deionized water, surface-active substances or solvents are used, supported by osmosis water treatment for virtually residue-free cleanliness.
This basic cleaning creates the conditions for subsequent fine and ultra-fine processes and is designed specifically for the requirements of the semiconductor, optics and aerospace industries.

Fine cleaning is a key step in cleaning large parts and ensures that residues are reliably removed even from large-format components from in-house production and the semiconductor industry.
The cooling lubricant is removed within 30 minutes of machining using the wet-on-wet process to prevent it from drying and thus preventing possible contamination.

Cleaning takes place in the cleaning container under controlled ambient conditions, with all process parameters being precisely matched to the respective component geometry and material.

Our precision cleaning at a glance:

• Multi-stage high-pressure and rinsing processes with demineralized water for low-particle cleanliness even in hard-to-reach areas

• Process parameters (pressure, temperature, cleaning media) precisely matched to the material and geometry

• Controlled environment in a closed cleaning container for reproducible results

• Drying with purified compressed air or nitrogen to safely avoid recontamination

This stage ensures uniform, reproducible cleaning of all surfaces – the ideal preparation for subsequent ultra-fine cleaning at high-purity level.

In ultra-fine cleaning, large-format components are brought to a high-purity level under strictly controlled and particularly clean conditions. This cleaning stage is at the heart of large-format cleaning and guarantees a particle- and residue-free surface – even with complex geometries and high cleanliness requirements.

State-of-the-art technologies and processes are used to reliably remove soiling and residues:

Our ultra-fine cleaning at a glance:

• High-pressure process, multi-stage rinsing technology and steam cleaning for maximum cleaning performance

• Use of specialized solvents for particularly challenging contaminants

• Continuously monitored process parameters (conductivity, pH value, temperature) for reproducible results

• Drying with purified compressed air or nitrogen to safely avoid recontamination

An integrated UV and white light inspection directly in the container enables our trained employees to identify residues immediately and rework them in a targeted manner. This ensures that every component meets the cleanliness standards required by the high-tech industry.

This cleaning line is designed for aluminum and stainless steel; non-ferrous metals are treated via a separate process chain. Once ultra-fine cleaning is complete, the parts are discharged directly into the ISO 7 clean room, where packaging and quality assurance follow seamlessly – for reproducible cleanliness in large dimensions.